Leti & Mapper will present 3 papers on massively parallel electron-beam litho at SPIE Advanced Lithography 2018
LETI & MAPPER WILL PRESENT 3 PAPERS ON MASSIVELY PARALLEL ELECTRON-BEAM LITHO AT SPIE ADVANCED LITHOGRAPHY 2018
GRENOBLE, France and DELFT, Netherlands – Feb. 21, 2018 – Mapper and Leti will give three presentations on massively parallel electron-beam lithography at SPIE Advanced Lithography 2018, Feb. 25-March 1, in the San Jose Convention Center. In addition, Leti will host a workshop on "Alternative Lithography" on March 1 with Mapper, ARKEMA and EVG. For more information on the workshop, visit https://tinyurl.com/altlitho2018.
In addition to their invited paper, "Performance validation of Mapper's FLX-1200", at 4:20-5 p.m., on Feb. 27, in Room 211, Mapper and Leti presentations include:
• “Overlay and stitching metrology for massively parallel electron-beam lithography”, 4:40-5 p.m., Feb. 27, Room 220B, and
• “Process development for the maskless N40 via layer for security application”, 11:10-11:30 a.m., March 1, Room 210B.
Leti will present 15 papers in total during the five-day conference.
Mapper, based in Delft, The Netherlands, is developing a groundbreaking maskless lithography infrastructure for the semiconductor and nanofabrication industry. The capabilities of a maskless patterning system with 65,000 electron beams enable unique functionalities in high volume nanofabrication and specialized logic. Typical examples are security and identification chips and integrated optics functionalities on image sensors for smart phones. Mapper employs 270 people.
For further information, please visit mapper.nl
Leti, a technology research institute at CEA Tech, is a global leader in miniaturization technologies enabling smart, energy-efficient and secure solutions for industry. Founded in 1967, Leti pioneers micro-& nanotechnologies, tailoring differentiating applicative solutions for global companies, SMEs and startups. Leti tackles critical challenges in healthcare, energy and digital migration. From sensors to data processing and computing solutions, Leti’s multidisciplinary teams deliver solid expertise, leveraging world-class pre-industrialization facilities. With a staff of more than 1,900, a portfolio of 2,700 patents, 91,500 sq. ft. of cleanroom space and a clear IP policy, the institute is based in Grenoble, France, and has offices in Silicon Valley and Tokyo. Leti has launched 60 startups and is a member of the Carnot Institutes network. Follow us on www.leti-cea.com and @CEA_Leti.
CEA Tech is the technology research branch of the French Alternative Energies and Atomic Energy Commission (CEA), a key player in innovative R&D, defence & security, nuclear energy, technological research for industry and fundamental science, identified by Thomson Reuters as the second most innovative research organization in the world. CEA Tech leverages a unique innovation-driven culture and unrivalled expertise to develop and disseminate new technologies for industry, helping to create high-end products and provide a competitive edge.